Classification of polyurethane polishing pads
Classification by function: it can be divided into coarse polishing pads and fine polishing pads.Coarse polishing pads usually have a large material removal rate and are used to quickly remove large defects or margins on the surface of the material; fine polishing pads are mainly used to further improve the surface finish and make the surface meet higher accuracy requirements.
Classified by structure: there are slotted polishing pads and perforated polishing pads.The groove depth of the slotted polishing pad is usually a certain proportion of the thickness of the polishing pad. For example, the standard groove depth of Jidai Electronics is 1/2 of the thickness of the polishing pad. This design helps to promote the flow of polishing liquid, quickly discharge debris generated during the polishing process, and improve polishing efficiency and quality; There are many options for the aperture of the perforated polishing pad and the arrangement angle of the holes. For example, the aperture of Jidai Electronics' products is about 2mm, and the arrangement angle can be selected from 90°, 60°, 45°, etc., which are mainly used to optimize fluid distribution and reduce the risk of scratches, especially for precision machining of spherical or curved surfaces.
Classified according to the characteristics of foamed pores: there are porous and less porous types.Porous polishing pads can improve the fluidity of polishing powder and speed up the polishing rate; less porous polishing pads enhance the hydrophilicity and are suitable for processes with high surface wettability requirements.
Application areas of polyurethane polishing pads
Semiconductor industry: In the chip manufacturing process, it is used for the surface flattening of wafers to ensure the performance and reliability of the chip.For example, in the manufacture of integrated circuits, polyurethane polishing pads are used in the CMP process to accurately polish the thin film layer on the surface of the wafer to achieve nanoscale flatness, which provides a good foundation for subsequent lithography, etching and other processes.
Optical field: Jihua electronic polyurethane PAD can be used for polishing optical glass, lenses, etc. to obtain high surface quality and optical properties.Optical components such as camera lenses, telescope lenses, etc. need to go through a fine polishing process. Polyurethane CMP polishing pads can effectively remove scratches and defects on the surface and improve the light transmittance and imaging quality of the lenses.Metal processing industry: The surface of metal parts is polished to improve their surface finish and accuracy, and the appearance and performance of the parts are improved.For example, in the manufacture of auto parts and precision mechanical parts, the use of polyurethane polishing pads can make the metal surface achieve a mirror effect and improve the wear resistance and corrosion resistance of the parts.
Ceramic processing field: used for polishing ceramic materials to make the surface of the workpiece smooth and delicate and improve its aesthetics and practicality.After precision ceramic parts, ceramic substrates, etc. are polished with polyurethane polishing pads, not only the surface quality is improved, but also its mechanical properties and service life can also be improved.
